- JC系列用途及特點(diǎn)
Use and Features
●磁控濺射鍍膜設(shè)備主要用于在基片上鍍制金屬、半導(dǎo)體、電介質(zhì)、多元素化合物或混和物。利用濺射法可制備金屬膜、半導(dǎo)體膜、絕緣膜、硬質(zhì)膜、耐熱膜、耐腐蝕膜、超導(dǎo)膜、磁性膜、光學(xué)膜等各種特殊性能的薄膜。
●基片尺寸適應(yīng)范圍廣,可鍍制多種材料,工藝可控性好、靈活性強(qiáng)、重復(fù)性高、基片溫升小、膜層附著力強(qiáng),計(jì)算機(jī)全自動(dòng)控制,******性高。且安裝維護(hù)方便,占地位置小。
JC系列磁控濺射鍍膜機(jī)
Series JC Magnetron Sputtering Coater
主要機(jī)型及參數(shù)
Main models and parameters
Series JC Magnetron Sputtering Coater
主要機(jī)型及參數(shù)
Main models and parameters
型號(hào) Model | 應(yīng)用特點(diǎn) Application field | 裝片工作臺(tái)特點(diǎn) Features of film loading bench | 基片尺寸 Size of substrate | 產(chǎn)量/每小時(shí) 1μ鋁層厚度 Output per hour 1μm aluminum coating thickness | 厚度 均勻性 thickness homogeneity | 真空系統(tǒng) Vacuum system |
JC400-1/D | 適合科研、生產(chǎn)硅片及砷化鎵片 Scientific research,production of silicon film and gallium arsenide film | 全自動(dòng)盒對(duì)盒送片,濺射源數(shù)量可按工藝調(diào)整,低塵粒 Full automatic box-to-box film advance;quantity of sputtering source to be adiusted as per the process;low in density of dust particles | 4~6″ | 40 | ±5% | 低溫泵加 分子泵系統(tǒng) Cryogenic pump system added with molecular pump |
JC500-1/D | 適用于圓形片狀工件 Circular sheet work-piece | 工件可進(jìn)行公轉(zhuǎn),水平裝片 Revolution of work-piece available;horizontal film loading | 4″ | 16 | ±8% | 分子泵系統(tǒng) Turbomolecular pump system |
JC500-5/D | 適用于矩形片狀工件 Rectangular sheet work-piecevv | 工件可進(jìn)行公轉(zhuǎn),垂直裝片 Revolution of work-piece available;vertical film loading | 150x150mm | 10 | ±8% | 分子泵系統(tǒng) Turbomolecular pump system |
JC600-1/D | 適用于矩形片狀工件 Rectangular sheet work-piecevv | 工件架為十邊拄形,垂直裝片 work-piece holder in decagonal column shape;vertical film loading | 280x100mm | 20 | ±8% | 擴(kuò)散泵系統(tǒng) Diffusion pump system |
JC600-2/D | 適合科研、生產(chǎn)砷化鎵基片線寬亞微米級(jí) Scientific research,production of gallium arsenide film with line width at submicron level | 工件可進(jìn)行自傳、公轉(zhuǎn) 水平裝片 Rotation and revolution of work-piece available;horizontal film loading | 3″ | 24 | ±5% | 低溫泵系統(tǒng) Cryogenic pump system |
JC650-1/D | 適用于矩形或圓形片狀工件 Rectangular or circular sheet work-piece | 工件可進(jìn)行公轉(zhuǎn),水平裝片 revolution of work-piece available;horizontal film loading | Φ100mm | 10 | ±5% | 分子泵系統(tǒng) Turbomolecular pump system |